JPH0227563Y2 - - Google Patents
Info
- Publication number
- JPH0227563Y2 JPH0227563Y2 JP1984015015U JP1501584U JPH0227563Y2 JP H0227563 Y2 JPH0227563 Y2 JP H0227563Y2 JP 1984015015 U JP1984015015 U JP 1984015015U JP 1501584 U JP1501584 U JP 1501584U JP H0227563 Y2 JPH0227563 Y2 JP H0227563Y2
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- wafer
- wafers
- boat
- held
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1501584U JPS60129133U (ja) | 1984-02-07 | 1984-02-07 | 酸化膜生成用石英ボ−ト |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1501584U JPS60129133U (ja) | 1984-02-07 | 1984-02-07 | 酸化膜生成用石英ボ−ト |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60129133U JPS60129133U (ja) | 1985-08-30 |
JPH0227563Y2 true JPH0227563Y2 (en]) | 1990-07-25 |
Family
ID=30500468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1501584U Granted JPS60129133U (ja) | 1984-02-07 | 1984-02-07 | 酸化膜生成用石英ボ−ト |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60129133U (en]) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5355978A (en) * | 1976-10-29 | 1978-05-20 | Nec Corp | Vaccuum type vapor growth device |
JPS53148283A (en) * | 1977-05-30 | 1978-12-23 | Toshiba Ceramics Co | Silicon wafer jig |
JPS5720143U (en]) * | 1980-07-08 | 1982-02-02 | ||
JPS5844834U (ja) * | 1981-09-18 | 1983-03-25 | 日本電気ホームエレクトロニクス株式会社 | 半導体製造装置 |
-
1984
- 1984-02-07 JP JP1501584U patent/JPS60129133U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60129133U (ja) | 1985-08-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100260120B1 (ko) | 열처리 장치 | |
US5494524A (en) | Vertical heat treatment device for semiconductor | |
TW202229626A (zh) | 用於精確腔室匹配和製程控制的基座支座設計 | |
JP2008124091A (ja) | 半導体装置の処理装置および処理方法 | |
JPH0227563Y2 (en]) | ||
US4802842A (en) | Apparatus for manufacturing semiconductor device | |
JP3077447B2 (ja) | 気相成長方法及び反応容器 | |
JP2996355B2 (ja) | 縦型収納治具 | |
JPH057240Y2 (en]) | ||
US4955649A (en) | Apparatus for holding plates | |
JPS58108735A (ja) | 縦型反応管用バスケツト | |
EP0267462A2 (en) | Mass transferable semiconductor substrate processing and handling full shell carrier (boat) | |
US4876224A (en) | Silicon wafer for a semiconductor substrate and the method for making the same | |
JP2537563Y2 (ja) | 縦型減圧気相成長装置 | |
KR100772462B1 (ko) | 반도체 제조공정 및 반도체 제조장치 | |
WO2016029161A1 (en) | High speed epitaxy system and methods | |
JPS62229932A (ja) | 縦型収納治具 | |
JPS629712Y2 (en]) | ||
JPH04125921A (ja) | 縦型熱処理炉用ウェーハボート | |
JPH053244A (ja) | ウエハ治具 | |
KR20000025959A (ko) | 웨이퍼 캐리어 | |
JPH04157752A (ja) | 縦型半導体製造装置におけるキャリアステージ装置 | |
JP3244492B2 (ja) | 縦型cvd装置 | |
KR200377160Y1 (ko) | 반도체 웨이퍼 보트 | |
JP2534674Y2 (ja) | 縦形cvdボ−ト |